Proceedings of the
International Conference on Mechanical Engineering 2009
(ICME2009) 26- 28 December 2009, Dhaka, Bangladesh

ICME09-FM-06

THE EFFECT OF GAS FLOW RATE ON DEPOSITION RATE
USING CVD

M A Chowdhury1, D M Nuruzzaman1, M L Rahaman1 and M S Islam2
1Department of Mechanical Engineering
Dhaka University of Engineering and Technology, Gazipur, Bangladesh
2Mymensingh Polytechnic Institute, Mymensingh, Bangladesh

ABSTRACT

Solid thin films have been deposited on stainless steel 314 substrates in a hot filament thermal chemical vapor deposition (CVD) reactor at different flow rates of natural gas. The variation of thin film deposition rate with the variation of gas flow rate has been investigated experimentally. During experiment, the effect of gap between activation heater and substrate on the deposition rate has also been observed. Results show that deposition rate on SS 314 increases with the increase of gas flow rate. It is also seen that deposition rate increases with the decrease of gap between activation heater and substrate within the observed range. In addition, friction coefficient and wear rate of SS 314 sliding against SS 304 under different normal loads are also investigated before and after deposition. The obtained results reveal that the values of friction coefficient and wear rate are lower after deposition than that of before deposition.

Keywords: Deposition rate, Gas flow rate, CVD.

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